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ion-beam sputtering

См. также в других словарях:

  • ion-beam sputtering — jonpluoštis dulkinimas statusas T sritis radioelektronika atitikmenys: angl. ion beam sputtering vok. Ionenstrahlkatodenzerstäubung, f; Ionenstrahlzerstäubung, f rus. ионно пучковое распыление, n pranc. pulvérisation par faisceau ionique, f …   Radioelektronikos terminų žodynas

  • Ion-beam sculpting — Ion Beam scultping is a term used to describe a two step process to make solid state nanopores. The term itself was coined by Golovchenko and co workers at Harvard in the paper Ion beam sculpting at nanometer length scales [J. Li, D. Stein, C.… …   Wikipedia

  • Ion beam assisted deposition — or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing… …   Wikipedia

  • Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …   Wikipedia

  • Ion beam lithography — By analogy to E beam lithography, focused ion beam lithography scans an ion beam across a surface to form a pattern. The ion beam may be used for directly sputtering the surface, or may induce chemical reactions in the exposed top layer (resist) …   Wikipedia

  • Focused ion beam — Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site specific analysis, deposition, and ablation of materials. The FIB is a scientific instrument that resembles a… …   Wikipedia

  • Sputtering — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique …   Wikipédia en Français

  • Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… …   Wikipedia

  • Ion plating — is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition . Ion plating utilizes concurrent or periodic bombardment of the substrate and …   Wikipedia

  • Pulvérisation cathodique (sputtering) — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique …   Wikipédia en Français

  • Secondary ion mass spectrometry — Infobox chemical analysis name = Secondary ion mass spectrometry caption =CAMECA IMS3f Magnetic SIMS Instrument acronym = SIMS classification =Mass spectrometry analytes = Solid surfaces, thin films related = Fast atom bombardment… …   Wikipedia

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